0095-腐蚀、浸蚀、侵蚀;还是蚀刻

腐蚀、浸蚀、侵蚀;还是蚀刻
|
Method |
Definition |
1. |
Anodic etching |
Reveals the microstructure by selective anodic dissolution of the polished surface using a DC current. Variation with layer formation: anodizing |
2. |
Attack polishing |
Simultaneous etching while mechanical polishing |
3. |
Cathodic etching |
See ion etching. |
4. |
Cold etching |
Reveals the microstructure at room temperature and below |
5. |
Controlled etching |
Electrolytic etching with selection of suitable etchant and voltage, resulting in a balance between current and dissolved metal ions |
6. |
Crystal figure etching |
Discontinuity in etching depending on crystal orientation. Distinctive sectional figures form at polished surface. Closely related to dislocation etching |
7. |
Deep etching |
Macroetching, especially for steels, to determine the overall character of the material(presence of imperfections such as seam defects, rolling defects, forging bursts, remnant shrinkage voids, cracks, and coring) |
8. |
Dislocation etching |
Reveals exit points of dislocations on the sample surface. Etching of dislocations is caused by their strain field ranging over a distance of several atoms. Crystal figures(etch pits) are formed at the exiting points. For example, etch pits for cubic materials are cube faced. |
9. |
Dissolution etching |
Reveals the microstructure by surface removal |
10. |
Double etching |
Two etchants are used sequentially, the second one will accentuate a particular microstructural feature. |
11. |
Drop etching |
Placing a drop of an etchant on a selected area of the sample surface to develop the alloying microconstituents (drip reaction) |
12. |
Dry etching |
Develops the microstructure by gaseous exposure |
13. |
Electrochemical (chemical etching) |
General term for revealing the microstructure by redox reactions |
14. |
Electrolytic etching |
See anodic etching. |
15. |
Etch rinsing |
Pouring the etchant over a tilted sample surface until the structure is revealed. Used for etching with severe gas evolution |
16. |
Eutectic cell etching |
Reveals eutectic grains (cells) |
17. |
Grain-boundary etching |
Reveals the intersections of individual grains. Grain boundaries have a higher dissolution potential than the individual grains because of their high density of structural defects. Accumulation of impurities in grain boundaries increases this effect. |
18. |
Grain-contrast etching |
Etching the surface of the grains according to their crystal orientation. They become distinct by the different reflectivity caused by reaction layers or surface roughness. |
19. |
Heat tinting |
Formation of interference colors in air or other gases, usually at elevated temperature |
20. |
Hot etching |
Development and stabilization of the microstructure at elevated temperature in etching solutions or gases |
21. |
Identification(selective) etching |
Etching for the identification of particular microconstituents without attacking any others |
22. |
Immersion etching |
The sample is immersed in the etchant with the polished surface up and is agitated. This is the most common etching method. |
23. |
Immersion etching (cyclic) |
Alternate immersion into two etchants: 1, the actual etchant; 2, solution to dissolve the layer formed during the etching process of 1 |
24. |
Ion etching |
Surface removal by bombardment with accelerated ions in a vacuum (1 to 10 kV) |
25. |
Long-term etching |
Etching times of a few minutes to several hours |
26. |
Macroetching |
Reveals the macrostructure for the examination with the unaided eye or at a magnification of 50× or less |
27. |
Microetching |
Reveals the microstructure for microscopic observation at a magnification of 50× or higher |
28. |
Multiple etching |
A sample is etched sequentially with specific etchants to reveal certain constituents. |
29. |
Network etching |
Formation of networks (subgrain boundaries), especially in mild steels after etching in nitric acid |
30. |
Optical etching |
Develops the microstructure by using special illumination techniques (dark-field, phase contrast, interference contrast, polarized light) |
31. |
Physical etching |
Develops the microstructure through removal of surface atoms or lowering the grain surface potential |
32. |
Plasma etching |
High-frequency electromagnetic vibrations produce radicals in a gas mixture that react with the sample surface and cause its removal. |
33. |
Potentiostatic etching |
Anodic development of the microstructure at a constant potential enables a defined etching of singular phases. |
34. |
Precipitation etching |
Develops the microstructure by the formation of reaction products at the sample surface |
35. |
Primary etching |
Develops the cast microstructures including coring |
36. |
Print etching(printing) |
A carrier material is soaked with an etching solution and is pressed onto the sample surface. The etchant reacts with one of the microstructural constituents forming substances that affect the carrier material. The result is a direct imprint as a life-size image. It is used for the identification of specific elements, for example, sulfur. |
37. |
Secondary etching |
Develops the microstructures that differ from primary structures through transformation and heat treatment in the solid state |
38. |
Segregation (coring) etching |
Develops segregation (coring) mainly in macrostructures and microstructures of castings |
39. |
Short-term etching |
Etching time of seconds to a few minutes |
40. |
Shrink etching |
Produces a precipitate coating on the grain surfaces and shrinks upon drying, generating cracks. Crack orientation depends on the underlying crystal structure. |
41. |
Staining |
Precipitation etching that causes contrast by distinctive staining of microconstituents; different interference colors originate from surface layers of varying thickness. Identifies inhomogeneities |
42. |
Strain etching |
Reveals regions of high deformation within undeformed areas. Strained areas show increased segregations of precipitates. |
43. |
Swabbing |
Wiping the sample surface with cotton saturated with the etchant; this will simultaneously remove undesired reaction products. |
44. |
Thermal etching |
Annealing the specimen in a vacuum or inert atmosphere. This is a preferred technique for high-temperature microscopy and for ceramics. |
45. |
Wet etching |
The sample surface has been wetted before immersion into the etching solution. This is important when using color etchants. |
46. |
Wipe etching |
See swabbing. |
Source: Ref 1
Reference cited in this section
1. G. Petzow, Metallographic Etching, 2nd ed., ASM International, 1999
The Soldier and his Wife. Etching
by Daniel Hopfer, who is believed to have been the first to apply
the technique to printmaking
(http://en.wikipedia.org/wiki/Corrosion)
Rust, the most familiar example of corrosion.
Volcanic gases have sped the
corrosion of this abandoned mining
machinery